| 摘要 |
The present invention provides a substrate treatment method using a substrate treatment apparatus comprising a treatment container and a rotary table which is installed in the treatment container to be rotatable and has a substrate loading unit. The substrate treatment method comprises: loading a substrate on the substrate loading unit, and supplying treatment gas into the treatment container to perform a treatment on the loaded substrate. While the substrate is loaded on the substrate loading unit, at least water vapor is supplied into the treatment container, and the substrate on the substrate loading unit is discharged. |
