| 主权项 |
1. A compound having the following structure:wherein:
R1 is selected from the group consisting of hydrogen, hydroxy, halo, lower alkyl, and lower alkoxy; R2 is selected from the group consisting of hydrogen, hydroxy, halo, lower alkyl, and lower alkoxy; R3 is selected from the group consisting of hydrogen, hydroxy, halo, lower alkyl, and lower alkoxy; R4 is selected from the group consisting of hydrogen, hydroxy, halo, lower alkyl, and lower alkoxy; R5 is selected from the group consisting of hydrogen, hydroxy, halo, lower alkyl, and lower alkoxy; R6 is selected from the group consisting of hydrogen, hydroxy, halo, lower alkyl, and lower alkoxy; L is selected from —CH2—CH═CH—CH2—, —CH2—CH(OH)—CH2—, —CH2—CH(OH)—CH2—O—CH2—CH(OH)—CH2—, —CH2—O—CH2—, —CH2—CH2—CH(CH3)—CH2—CH2—, —CH2—CO—CH2—and —CH2—CH2—O—CH2—CH2—; (a) is one; (b) is one; X1, when present, is a spacer moiety selected from the group consisting of —C(O)O—, —OC(O)—, —NH—C(O)O—, —OC(O)—NH— and a carbonyl; X2, when present, is a spacer moiety selected from the group consisting of —C(O)O—, —OC(O)—, —NH—C(O)O—, —OC(O)—NH— and a carbonyl; POLY1 is a poly(ethylene oxide) oligomer having a number of repeating monomers in the range of from 1 to 30; and POLY2 is a poly(ethylene oxide) oligomer having a number of repeating monomers in the range of from 1 to 30. |
