发明名称 Liquid crystal display device comprising an alignment film subjected to an optical alignment treatment and having a photoconductive characteristic
摘要 A high quality liquid crystal display device has an alignment film with a photoconductive characteristic. Since a region having gate lines situated therebelow does not undergo irradiation of a backlight, no photoconductive effect can be obtained. A photoresist is disposed below the alignment film situated over the gate lines in order to transfer the charges in the region to an opening portion of the alignment film in an early stage. Since the photoresist has a thickness of about 1.5 μm, which is 20 times or more the 70 nm thickness of the alignment film, the resistance in the lateral direction is low in a portion where the photoresist is present. Accordingly, since the charges on the alignment film present over the gate line transfer to the opening portion of the alignment film and are eliminated in an early stage, the residual image is eliminated in the early stage.
申请公布号 US9086591(B2) 申请公布日期 2015.07.21
申请号 US201213675417 申请日期 2012.11.13
申请人 Japan Display Inc. 发明人 Matsui Chikae;Kunimatsu Noboru;Sonoda Hidehiro
分类号 G02F1/1337;G02F1/1335;G02F1/13;G02F1/1333 主分类号 G02F1/1337
代理机构 Ulmer & Berne LLP 代理人 Ulmer & Berne LLP
主权项 1. A liquid crystal display device comprising: a liquid crystal display panel where liquid crystals are put between a TFT substrate and a counter substrate, the TFT substrate having pixel electrodes formed each in an opening region surrounded by gate lines and data lines, and a backlight disposed at the back of the liquid crystal display panel, wherein an alignment film is formed to cover the gate lines, the data lines, and the pixel electrodes, the alignment film is subjected to an optical alignment treatment, the alignment film has a photoconductive characteristic, a photoresist is disposed below the alignment film that covers the gate lines in a non-opening region, an edge of the photoresist contacts the alignment film formed in the opening region, and a top of the photoresist contacts the alignment film formed in the non-opening region.
地址 Tokyo JP