发明名称 |
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS |
摘要 |
The present invention provides the chemically amplified negative resist composition comprises an onium salt represented by the following general formula (0-1), a resin which becomes alkali insoluble by an action of an acid and an acid generator,;wherein Rf represents a fluorine atom or a trifluoromethyl group; Y represents a cyclic hydrocarbon group having 3 to 30 carbon atoms, the hydrogen atom in the cyclic hydrocarbon group may be substituted by a hetero atom itself or a monovalent hydrocarbon group which may be substituted by a hetero atom(s), and the hetero atom(s) may be interposed into the cyclic structure of the cyclic hydrocarbon group and the monovalent hydrocarbon group; and M+ represents a monovalent cation. There can be provided a chemically amplified negative resist composition which can improve resolution at the time of forming a pattern and give a pattern with less line edge roughness (LER). |
申请公布号 |
US2015198877(A1) |
申请公布日期 |
2015.07.16 |
申请号 |
US201414586120 |
申请日期 |
2014.12.30 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
DOMON Daisuke;MASUNAGA Keiichi;WATANABE Satoshi;OHASHI Masaki |
分类号 |
G03F7/027;G03F7/30;G03F7/20;G03F7/038 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
1. A chemically amplified negative resist composition which comprises an onium salt represented by the following general formula (0-1), a resin which becomes alkali insoluble by an action of an acid and an acid generator, wherein Rf represents a fluorine atom or a trifluoromethyl group; Y represents a cyclic hydrocarbon group having 3 to 30 carbon atoms, the hydrogen atom in the cyclic hydrocarbon group may be substituted by a hetero atom itself or a monovalent hydrocarbon group which may be substituted by a hetero atom(s), and the hetero atom(s) may be interposed into the cyclic structure of the cyclic hydrocarbon group and the monovalent hydrocarbon group; and M+ represents a monovalent cation. |
地址 |
Tokyo JP |