发明名称 FINFET CAPACITOR AND MANUFACTURING METHOD THEREOF
摘要 A capacitor includes a semiconductor substrate. The capacitor also includes a first terminal having a fin disposed on a surface of the semiconductor substrate. The capacitor further includes a dielectric layer disposed onto the fin. The capacitor still further includes a second terminal having a FinFET compatible high-K metal gate disposed proximate and adjacent to the fin.
申请公布号 EP2893560(A1) 申请公布日期 2015.07.15
申请号 EP20130763160 申请日期 2013.09.04
申请人 QUALCOMM INCORPORATED 发明人 ZHANG, RON;CHUA-EOAN, LEW G.;GU, SHIQUN
分类号 H01L21/84;H01L27/06;H01L27/12;H01L27/13;H01L49/02 主分类号 H01L21/84
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