| 发明名称 |
LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>The present invention relates to a support table formed to support a substrate. The support table comprises: a support part supporting a substrate; and a conditioning system supplying heat energy to the support part and/or removing heat energy from the support part. The conditioning system comprises multiple independently controllable conditioning units.</p> |
| 申请公布号 |
KR20150082145(A) |
申请公布日期 |
2015.07.15 |
| 申请号 |
KR20150089792 |
申请日期 |
2015.06.24 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KUNNEN JOHAN GERTRUDIS CORNELIS;JACOBS JOHANNES HENRICUS WILHELMUS;VERSPAGET COEN CORNELIS WILHELMUS;VAN DER HAM RONALD;THOMAS IVO ADAM JOHANNES;HOUBEN MARTIJN;LAURENT THIBAULT SIMON MATHIEU;CORCORAN GREGORY MARTIN MASON;BLOKS RUUD HENDRIKUS MARTINUS JOHANNES;PIETERSE GERBEN;GUNTER PIETER LEIN JOSEPH;REMIE MARINUS JAN;DERKS SANDER CATHARINA REINIER |
| 分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
| 代理机构 |
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