发明名称 Methods for forming patterns on curved surfaces
摘要 Methods are disclosed by which two-dimensional and three-dimensional pattern layers may be formed on non-planar surfaces, including optical elements such as lenses with one or more cylindrical, spherical or aspheric surfaces. Patterns with features in the micro- and/or nano-size regime comprised of organic, inorganic or metallic materials may be formed by the methods described herein.
申请公布号 US9079349(B2) 申请公布日期 2015.07.14
申请号 US201414463069 申请日期 2014.08.19
申请人 MicroContinuum, Inc. 发明人 Slafer W. Dennis
分类号 B29D11/00;B29C59/00;B29C59/02;B29L11/00;B29K101/00 主分类号 B29D11/00
代理机构 McDermott Will and Emery LLP 代理人 McDermott Will and Emery LLP
主权项 1. A method for fabricating a pattern on a compound curved surface, said method comprising: a. forming a relief pattern on a stretchable surface to form a replication mold, b. coating a layer of curable polymer material on said stretchable surface, c. causing said coated stretchable surface to come in conformal compliant contact with a curved substrate d. exposing said curable polymer material to radiation to cause solidification of said polymer material, e. withdrawing said stretchable mold from contact with said substrate so as to leave the solidified polymer having a pattern complementary to that of the relief pattern of the stretchable replication mold as a layer on the surface of said substrate.
地址 Cambridge MA US