| 摘要 |
<p>Provided are an apparatus and a method for treating a substrate with a liquid chemical. The apparatus for treating the substrate comprises: a container providing a treatment space inside, where the top is opened; a support plate supporting and rotating the substrate in the treatment space; a liquid chemical supply unit supplying the liquid chemical on the substrate supported on the support plate; an exhaust unit exhausting air of the treatment space; and a fume removal unit located at the top of the container and removing fume located on an upper end of the container. A lower area in the container is exhausted to the exhaust unit, and an upper area is exhausted to the fume removal unit. Accordingly, the present invention can prevent the fume generated in the container from being exposed outside the container.</p> |
