发明名称 SUBSTRATE HOLDING DEVICE AND SUBSTRATE HOLDING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate holding device and a substrate holding method capable of surely holding a substrate while inhibiting the substrate from being deformed.SOLUTION: A substrate holding device 1A includes a chuck part 2 for functioning as a holding part to hold a substrate W by negative pressure generated by swirling flow. This chuck part 2 includes: a recess shaped internal chamber 11 in which the swirling flow is generated; gas jet passages 21b and 21c which jet gas in the internal chamber 11; and a pillar 12 of a columnar shape provided on the bottom surface of the internal chamber 11.</p>
申请公布号 JP2015126174(A) 申请公布日期 2015.07.06
申请号 JP20130271297 申请日期 2013.12.27
申请人 SHIBAURA MECHATRONICS CORP 发明人 KANAI TAKAHIRO;OTAGAKI TAKASHI;MATSUI EMI;HAYASHI KONOSUKE
分类号 H01L21/677;B25J15/06;B65G49/07;H01L21/683 主分类号 H01L21/677
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