发明名称 |
SUBSTRATE HOLDING DEVICE AND SUBSTRATE HOLDING METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate holding device and a substrate holding method capable of surely holding a substrate while inhibiting the substrate from being deformed.SOLUTION: A substrate holding device 1A includes a chuck part 2 for functioning as a holding part to hold a substrate W by negative pressure generated by swirling flow. This chuck part 2 includes: a recess shaped internal chamber 11 in which the swirling flow is generated; gas jet passages 21b and 21c which jet gas in the internal chamber 11; and a pillar 12 of a columnar shape provided on the bottom surface of the internal chamber 11.</p> |
申请公布号 |
JP2015126174(A) |
申请公布日期 |
2015.07.06 |
申请号 |
JP20130271297 |
申请日期 |
2013.12.27 |
申请人 |
SHIBAURA MECHATRONICS CORP |
发明人 |
KANAI TAKAHIRO;OTAGAKI TAKASHI;MATSUI EMI;HAYASHI KONOSUKE |
分类号 |
H01L21/677;B25J15/06;B65G49/07;H01L21/683 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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