发明名称 DOUBLE GOLD PLATING METHOD AND ELECTRONIC COMPONENT
摘要 <p>Provided are: a low-cost gold plating method having excellent anticorrosion properties; and an electronic component which is produced using this gold plating method. In this double gold plating method, a base gold plating layer (2) is formed on the surface of a material to be plated (1) in a first plating process, and then a finishing gold plating layer (5) is formed on the surface of the base gold plating layer (2) by having gold crystals finer than those during the formation of the base gold plating layer (2) precipitate on the surface of the base gold plating layer (2) in a second plating process.</p>
申请公布号 WO2015097917(A1) 申请公布日期 2015.07.02
申请号 WO2013JP85281 申请日期 2013.12.28
申请人 NICHIEI GIKEN KABUSHIKI KAISHA 发明人 HAYASHI, SHIGERU
分类号 C25D5/10;C25D3/48;C25D7/00 主分类号 C25D5/10
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