发明名称 |
SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR PRODUCING THE SAME |
摘要 |
The semiconductor light-emitting element includes: a substrate; a semiconductor layer that is provided over the substrate; a first electrode that is provided in contact with part of an upper surface of the semiconductor layer and includes a current supply part; a second electrode that is provided in part of a region vertically below a region where the current supply part is not provided, that is in contact with part of the semiconductor layer; and a first current blocking layer that is provided in a region including a region vertically below the current supply part and that is in contact with part of the semiconductor layer, wherein a contact resistance at an interface between the first current blocking layer and the semiconductor layer is higher than that at an interface between the second electrode and the semiconductor layer. |
申请公布号 |
US2015171271(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
US201414561968 |
申请日期 |
2014.12.05 |
申请人 |
USHIO DENKI KABUSHIKI KAISHA |
发明人 |
INOUE Takahiro;TSUKIHARA Masashi;MIYOSHI Kohei |
分类号 |
H01L33/14;H01L33/42;H01L33/00;H01L33/62;H01L33/40 |
主分类号 |
H01L33/14 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor light-emitting element comprising:
a substrate; a semiconductor layer that is provided over the substrate and comprises a p-type semiconductor layer, a light-emitting layer, and an n-type semiconductor layer; a first electrode that is provided in contact with part of an upper surface of the semiconductor layer and comprises a current supply part connected to a current supply line; a second electrode that is provided in part of a region vertically below a region where the current supply part is not provided, that is in contact with part of a bottom surface of the semiconductor layer, and that is made of a material that reflects light emitted from the light-emitting layer; and a first current blocking layer that is provided in a region including a region vertically below the current supply part and that is in contact with part of the bottom surface of the semiconductor layer, wherein a contact resistance at an interface between the first current blocking layer and the semiconductor layer is higher than that at an interface between the second electrode and the semiconductor layer. |
地址 |
Tokyo JP |