发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device and a ferroelectric element that are easily used in a liquid process and capable of controlling orientation.SOLUTION: A manufacturing method according to the present invention relates to a semiconductor device, comprises: source and drain electrodes; an organic semiconductor film disposed between the source electrode and the drain electrode and having a channel portion; a gate electrode; and a gate insulating film disposed between the channel portion and the gate electrode. The manufacturing method comprises the steps of: heating the channel portion to a first temperature; and forming the gate insulating film by a coating process of arranging a droplet material including an insulating polymer of a second temperature lower than the first temperature on the organic semiconductor film of the first temperature and extending the droplet material in a certain direction.
申请公布号 JP2015111741(A) 申请公布日期 2015.06.18
申请号 JP20150049138 申请日期 2015.03.12
申请人 SEIKO EPSON CORP 发明人 YASUDA TAKURO
分类号 H01L21/8246;H01L21/336;H01L27/105;H01L27/28;H01L29/417;H01L29/423;H01L29/49;H01L29/786;H01L29/788;H01L29/792;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L21/8246
代理机构 代理人
主权项
地址