发明名称 THIN FILM TRANSISTOR SUBSTRATE AND PRODUCTION METHOD FOR THIN FILM TRANSISTOR SUBSTRATE
摘要 Provided is a thin film transistor substrate (1) comprising a thin film transistor (DrTr) that includes an oxide semiconductor layer (5), a source electrode (7S), and a drain electrode (7D). The thin film transistor substrate (1) additionally comprises: first wiring (9) that is formed in a layer that is above the layer in which the source electrode (7S) and the drain electrode (7D) are formed and that is connected to at least one of the source electrode (7S) and the drain electrode (7D); and a terminal (12) that is formed in a layer that is above the layer in which the first wiring (9) is formed and that is connected to the first wiring (9). The source electrode (7S) or the drain electrode (7D) that is connected to the first wiring (9) contains copper. The first wiring (9) is a layered film that comprises a first film (9a) (a transparent conductive film), a second film (9b) (a copper film), and a third film (9c) (a copper-manganese alloy film) that are layered in this order from bottom to top. The terminal (12) comprises an aluminum alloy.
申请公布号 WO2015087466(A1) 申请公布日期 2015.06.18
申请号 WO2014JP04243 申请日期 2014.08.20
申请人 JOLED INC. 发明人 SAITO, TORU
分类号 H01L29/786;H01L21/28;H01L21/3205;H01L21/768;H01L23/522;H01L23/532;H01L29/41;H01L51/50;H05B33/10;H05B33/26 主分类号 H01L29/786
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