| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a lithography apparatus which is advantageous for stabilization of a potential applied to a deflector. <P>SOLUTION: The lithography apparatus has a deflector and performs drawing on a substrate by means of a charged particle beam deflected by the deflector. The deflector 19 includes an electrode d(d1-d4) which configures electrode pairs generating an electrical field for deflecting the charged particle beam and to which a potential is applied via lines, and a capacitor 50 having one end connected with the electrode d and the other grounded end. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
