发明名称 Beam monitor system and particle beam irradiation system
摘要 A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adj acent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller (8b) that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device.
申请公布号 EP2884307(A1) 申请公布日期 2015.06.17
申请号 EP20140194839 申请日期 2014.11.26
申请人 HITACHI, LTD. 发明人 HORI, YOSHIHITO;MATSUSHITA, TAKAYOSHI;MORIYAMA, KUNIO;TADOKORO, MASAHIRO
分类号 G01T1/29 主分类号 G01T1/29
代理机构 代理人
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