发明名称 |
Beam monitor system and particle beam irradiation system |
摘要 |
A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adj acent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller (8b) that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device. |
申请公布号 |
EP2884307(A1) |
申请公布日期 |
2015.06.17 |
申请号 |
EP20140194839 |
申请日期 |
2014.11.26 |
申请人 |
HITACHI, LTD. |
发明人 |
HORI, YOSHIHITO;MATSUSHITA, TAKAYOSHI;MORIYAMA, KUNIO;TADOKORO, MASAHIRO |
分类号 |
G01T1/29 |
主分类号 |
G01T1/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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