发明名称 投射材の投射装置
摘要 <p>A projection device for shot medium that performs surface treatment by bombarding a granular shot medium on a workpiece, the device being configured so as to be capable of continuous projection without the shot medium being exhausted as a result of the device being provided with: a projection means for projecting the shot medium on the workpiece; a scanning means for scanning the projection means in a specified direction; a shot medium-recovering means for recovering the shot medium sprayed toward the workpiece from the projection means; and a shot medium-supplying means for recirculating the shot medium, which has been recovered by the shot medium-recovering means, to the projection means.</p>
申请公布号 JP5732000(B2) 申请公布日期 2015.06.10
申请号 JP20120066848 申请日期 2012.03.23
申请人 发明人
分类号 B24C9/00;B24C3/06;B24C5/06;B24C7/00 主分类号 B24C9/00
代理机构 代理人
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