| 摘要 |
<p>The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R2, R3, R5, R7, R8, and R10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R4 and R6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R4 and R6 are linked together to form an alkylene group,—O—, or—S—; R9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or—COOR11; R11 represents an alkyl group; X represents—O—or >N—R12; R12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O)n; n is an integer of 0 to 2; and the wavy lines represent that either R8 or R9 may be in an endo or exo position.</p> |
