发明名称 Mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers
摘要 In some embodiments, an improved mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers is presented. In this regard, a substrate build-up film is introduced having epoxy material and a plurality of epoxy microspheres, wherein an interior of the microspheres is not fully cured. Other embodiments are also disclosed and claimed.
申请公布号 US9040842(B2) 申请公布日期 2015.05.26
申请号 US201313867851 申请日期 2013.04.22
申请人 Intel Corporation 发明人 Nalla Ravi;Bchir Omar;Jomaa Houssam
分类号 H01L23/00;H05K3/38;H05K3/46;H05K1/02;H05K3/18 主分类号 H01L23/00
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. An apparatus comprising: a substrate build-up film, wherein the build-up film comprises: an epoxy material; and a plurality of epoxy microspheres, wherein an interior of the microspheres is not fully cured and an exterior formed from the same material as the interior, is more cured than the interior.
地址 Santa Clara CA US