发明名称 SILICON CARBIDE SINGLE CRYSTAL PRODUCTION METHOD, AND SILICON CARBIDE SINGLE CRYSTAL PRODUCTION DEVICE
摘要 <p>A SiC single crystal is grown from a first seed crystal (50a) formed from silicon carbide, and the SiC single crystal is cut to form a base section (51c), a tip section (51a) and a middle section (51b); the middle section (51b) is removed, the base section (51c) and tip section (51a) are joined as a second seed crystal (50b), and from the growth face (52) thereof, a SiC single crystal is grown.</p>
申请公布号 WO2015072462(A1) 申请公布日期 2015.05.21
申请号 WO2014JP79875 申请日期 2014.11.11
申请人 CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY;DENSO CORPORATION 发明人 KAMATA, ISAHO;TSUCHIDA, HIDEKAZU;HOSHINO, NORIHIRO;KOJIMA, JUN
分类号 C30B29/36 主分类号 C30B29/36
代理机构 代理人
主权项
地址