发明名称 APPARATUS FOR PROCESSING SUBSTRATE
摘要 An apparatus for processing a substrate of the present invention comprises an index unit; a process treating unit in which treatment rooms treating the substrate are arranged in layers; and a test unit arranged on an index module and the process treating unit. The test unit comprises: a first test chamber having a first test return robot, and a first test module which is arranged in the location in which the first test return robot can access, and performs a test process of a first item to substrates of a first purchasing among substrates treated in the process treating unit; and a second test chamber having a second test return robot, and a second test module which is arranged in the location in which the second test return robot can access, and performs a test process of a second item which is different with the first item to substrates of a second purchasing among substrates treated in the process treating unit.
申请公布号 KR20150050286(A) 申请公布日期 2015.05.08
申请号 KR20130165411 申请日期 2013.12.27
申请人 SEMES CO., LTD. 发明人 HWANG, SOO MIN;OH, DOO YOUNG;KANG, DONG YEON;LEE, OK SEONG
分类号 H01L21/66;H01L21/027 主分类号 H01L21/66
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