Compression method and system for use with multi-patterning

摘要

A method comprises (a) providing an integrated circuit (IC) layout comprising data representing a plurality of circuit patterns to be formed on or in a single layer of an IC by multi-patterning; (b) dividing the plurality of circuit patterns into two or more groups; (c) assigning the circuit patterns within each group to a respective mask to provide mask assignment data, for forming each group of circuit patterns on or in the single layer of the IC; (d) compressing the mask assignment data; and (e) storing the compressed mask assignment data to a non-transitory machine readable storage medium for use by an electronic design automation tool configured for reconstructing the mask assignment data from the compressed data.

主权项

1. A method comprising:
providing an integrated circuit (IC) layout comprising data representing a plurality of circuit patterns to be formed on or in a single layer of a single IC by multipatterning using at least two photomasks to pattern the single layer of the IC, such that first circuit patterns to be formed by the first mask and second circuit patterns to be formed by the second mask are added to form the IC layout including the first circuit patterns and second circuit patterns; providing mask assignment data identifying which of the at least two photomasks will be used to form each individual circuit pattern on or in the single layer of the single IC; compressing the mask assignment data by using a computer; storing the compressed mask assignment data to a non-transitory machine readable storage medium for use by an electronic design automation tool configured for reconstructing the mask assignment data from the compressed data.