发明名称 |
FILM FORMING APPARATUS |
摘要 |
A film forming apparatus includes a stage provided in the processing chamber; three or more targets uniformly arranged along a circle centering around a vertical axis line that passes through a center of the stage, each of the targets having a substantially rectangular shape; a shutter provided between the targets and the stage, the shutter including an opening which allows one of the targets to be selectively exposed to the stage; and a rotation shaft coupled to the shutter, the rotation shaft extending along the vertical axis line. A width of the opening in a tangent direction to the circle centering around the vertical axis line is set such that two adjacent targets in a circumferential direction of the circle among the targets are allowed to be partially and simultaneously exposed to the stage. |
申请公布号 |
US2015114835(A1) |
申请公布日期 |
2015.04.30 |
申请号 |
US201414525096 |
申请日期 |
2014.10.27 |
申请人 |
Tokyo Electron Limited |
发明人 |
GOMI Atsushi;FURUKAWA Shinji;NAKAMURA Kanto;ONO Kazunaga |
分类号 |
H01J37/34 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
1. A film forming apparatus comprising:
a processing chamber; a stage provided in the processing chamber; three or more targets uniformly arranged along a circle centering around a vertical axis line that passes through a center of the stage in a vertical direction, each of the targets having a substantially rectangular shape; a gas supply unit configured to supply a gas into the processing chamber; a power supply configured to generate a negative DC voltage to be applied to the targets; a shutter provided between the targets and the stage, the shutter including an opening which allows one of the targets to be selectively exposed to the stage; and a rotation shaft coupled to the shutter, the rotation shaft extending along the vertical axis line, wherein a width of the opening in a tangent direction to the circle centering around the vertical axis line is set such that two adjacent targets in a circumferential direction of the circle among the targets are allowed to be partially and simultaneously exposed to the stage. |
地址 |
Tokyo JP |