发明名称 FILM FORMING APPARATUS
摘要 A film forming apparatus includes a stage provided in the processing chamber; three or more targets uniformly arranged along a circle centering around a vertical axis line that passes through a center of the stage, each of the targets having a substantially rectangular shape; a shutter provided between the targets and the stage, the shutter including an opening which allows one of the targets to be selectively exposed to the stage; and a rotation shaft coupled to the shutter, the rotation shaft extending along the vertical axis line. A width of the opening in a tangent direction to the circle centering around the vertical axis line is set such that two adjacent targets in a circumferential direction of the circle among the targets are allowed to be partially and simultaneously exposed to the stage.
申请公布号 US2015114835(A1) 申请公布日期 2015.04.30
申请号 US201414525096 申请日期 2014.10.27
申请人 Tokyo Electron Limited 发明人 GOMI Atsushi;FURUKAWA Shinji;NAKAMURA Kanto;ONO Kazunaga
分类号 H01J37/34 主分类号 H01J37/34
代理机构 代理人
主权项 1. A film forming apparatus comprising: a processing chamber; a stage provided in the processing chamber; three or more targets uniformly arranged along a circle centering around a vertical axis line that passes through a center of the stage in a vertical direction, each of the targets having a substantially rectangular shape; a gas supply unit configured to supply a gas into the processing chamber; a power supply configured to generate a negative DC voltage to be applied to the targets; a shutter provided between the targets and the stage, the shutter including an opening which allows one of the targets to be selectively exposed to the stage; and a rotation shaft coupled to the shutter, the rotation shaft extending along the vertical axis line, wherein a width of the opening in a tangent direction to the circle centering around the vertical axis line is set such that two adjacent targets in a circumferential direction of the circle among the targets are allowed to be partially and simultaneously exposed to the stage.
地址 Tokyo JP