| 发明名称 | Overlay mark and method of forming the same | ||
| 摘要 | A method of forming an overlay mark is provided. A plurality of photoresist patterns are formed on a substrate. Each of the photoresist patterns includes a first strip and a plurality of second strips arranged in parallel. The first strip crosses the second strips to form a fence shape. Further, there is a space between two adjacent photoresist patterns, and the space is fence-shaped. A plurality of islands are formed in each of the spaces to form dot type strip patterns. The photoresist patterns are removed, and the dot type strip patterns serve as the overlay mark. | ||
| 申请公布号 | US9017926(B2) | 申请公布日期 | 2015.04.28 |
| 申请号 | US201213603427 | 申请日期 | 2012.09.05 |
| 申请人 | Nanya Technology Corporation | 发明人 | Chiu Chui-Fu |
| 分类号 | G03F9/00;G03F1/56;G03F7/00;G03F7/20 | 主分类号 | G03F9/00 |
| 代理机构 | Jianq Chyun IP Office | 代理人 | Jianq Chyun IP Office |
| 主权项 | 1. An overlay mark, comprising: a plurality of dot type strip patterns, each of the dot type strip patterns comprising at least three columns, wherein odd columns respectively have a plurality of first islands arranged in a first distance D3; even columns respectively have a plurality of second islands arranged in a second distance D4, wherein the adjacent first and second islands are staggered and are connected with each other at the corners. | ||
| 地址 | Taoyuan TW | ||