发明名称 |
Light-emitting semiconductor chip |
摘要 |
A semiconductor chip includes a semiconductor body with a semiconductor layer sequence. An active region intended for generating radiation is arranged between an n-conductive multilayer structure and a p-conductive semiconductor layer. A doping profile is formed in the n-conductive multilayer structure which includes at least one doping peak. |
申请公布号 |
US9012885(B2) |
申请公布日期 |
2015.04.21 |
申请号 |
US201013518809 |
申请日期 |
2010.12.27 |
申请人 |
Osram Opto Semiconductors GmbH |
发明人 |
Peter Matthias;Meyer Tobias;Walter Alexander;Taki Tetsuya;Off Juergen;Butendeich Rainer;Hertkorn Joachim |
分类号 |
H01L29/06;H01L33/14;H01L33/04;H01L33/06;H01L33/22;H01L33/38 |
主分类号 |
H01L29/06 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A semiconductor chip comprising a semiconductor body with a semiconductor layer sequence, the semiconductor layer sequence comprising:
an n-conductive multilayer structure, wherein a doping profile is formed in the n-conductive multilayer structure, the doping profile comprising at least one doping peak; a p-conductive semiconductor layer; and an active region provided for generating radiation, the active region arranged between the n-conductive multilayer structure and the p-conductive semiconductor layer wherein the n-conducting multilayer structure comprises a quantum structure with a plurality of quantum layers, the quantum layers being arranged between barrier layers; wherein a doping profile is formed in the n-conductive multilayer structure, the doping profile comprising at least a first doping peak and a second doping peak; wherein at least one of the plurality of quantum layers of the n-conductive multilayer structure is arranged between the first doping peak and the second doping peak; wherein the n-conducting multilayer structure comprises a region that is adjacent to the first doping peak, the quantum layers and the barrier layers adjacent to the quantum layers having a low doping concentration in said region, wherein the low doping concentration is at least 1*1016 cm−3 and at most 1*1018 cm−3; and wherein a sub-region of the quantum structure of the n-conductive multilayer structure comprises a high doping concentration by way of the second doping peak. |
地址 |
Regensburg DE |