发明名称 ULTRASONIC DEVICE, ULTRASONIC PROBE, ULTRASONIC DIAGNOSTIC APPARATUS, AND METHOD OF MANUFACTURING ULTRASONIC DEVICE
摘要 An ultrasonic device includes a substrate, a first piezoelectric body, a second piezoelectric body, and an acoustic matching section. The substrate has a first surface that is a flat surface. The first piezoelectric body is disposed on the first surface of the substrate. The second piezoelectric body is disposed on the first surface of the substrate. The second piezoelectric body has a different thickness from a thickness of the first piezoelectric body as measured from the first surface of the substrate. The acoustic matching section is disposed on the first piezoelectric body and the second piezoelectric body. The acoustic matching section has a first side facing the first piezoelectric body and the second piezoelectric body, and a second side opposite from the first side. A surface of the acoustic matching section on the second side is a flat surface parallel with the first surface of the substrate.
申请公布号 US2015105663(A1) 申请公布日期 2015.04.16
申请号 US201414511324 申请日期 2014.10.10
申请人 SEIKO EPSON CORPORATION 发明人 Kiyose Kanechika;Uchiyama Toshikazu
分类号 A61B8/00;A61B8/14;A61B8/08;B06B1/06 主分类号 A61B8/00
代理机构 代理人
主权项 1. An ultrasonic device comprising: a substrate having a first surface, the first surface being a flat surface; a first piezoelectric body disposed on the first surface of the substrate; a second piezoelectric body disposed on the first surface of the substrate, the second piezoelectric body having a different thickness from a thickness of the first piezoelectric body as measured from the first surface of the substrate; and an acoustic matching section disposed on the first piezoelectric body and the second piezoelectric body, the acoustic matching section having a first side facing the first piezoelectric body and the second piezoelectric body, and a second side opposite from the first side, a surface of the acoustic matching section on the second side being a flat surface parallel with the first surface of the substrate.
地址 Tokyo JP