发明名称 Boron doped CVD diamond
摘要 <p>A layer of single crystal boron doped diamond produced by CVD and having a total boron concentration which is uniform. The layer is formed from a single growth sector, or has a thickness exceeding 100 µm, or has a volume exceeding 1 mm 3 , or a combination of such characteristics.</p>
申请公布号 EP1780315(B1) 申请公布日期 2015.04.15
申请号 EP20060076850 申请日期 2002.12.13
申请人 ELEMENT SIX TECHNOLOGIES LIMITED 发明人 SCARSBROOK, GEOFFREY ALAN;MARTINEAU, PHILIP MAURICE;TWITCHEN, DANIEL JAMES;WHITEHEAD, ANDREW JOHN;COOPER, MICHAEL ANDREW;DORN, BARBEL SUSANNE CHARLOTTE
分类号 C30B25/10;C30B29/04;C23C16/27 主分类号 C30B25/10
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