| 摘要 |
PROBLEM TO BE SOLVED: To perform etching of a wafer accurately while maintaining the elution component concentration in the etching liquid eluted from a wafer, without replacing the etching liquid entirely, within a predetermined certain range.SOLUTION: An etching method includes a plurality of etching steps, and an interval step between respective etching steps. Each etching step includes a first partial replacement pattern for discharging a first setting amount of the etching liquid used for etching, and supplying a second setting amount of new etching liquid. The interval step includes a second partial replacement pattern for discharging a third setting amount of the etching liquid used for etching, and supplying a fourth setting amount of new etching liquid. |
