发明名称 |
VACUUM EVAPORATION SYSTEM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vacuum evaporation system which can increase a total dispersion amount of a vapor deposition material from an evaporation source and improve film thickness uniformity to achieve a faster vapor deposition process.SOLUTION: A vacuum evaporation system includes a plurality of crucibles 20a, 20b which deposit a film of a vapor deposition material in opposition to a base plate arranged in a direction orthogonal to the longitudinal direction, and a heater 21-5 provided on outside-located one of longitudinal side faces of outermost crucibles 20a of the crucibles 20a, 20b.</p> |
申请公布号 |
JP2015067850(A) |
申请公布日期 |
2015.04.13 |
申请号 |
JP20130201817 |
申请日期 |
2013.09.27 |
申请人 |
HITACHI HIGH-TECH FINE SYSTEMS CORP |
发明人 |
OGATA TOMOHIKO;MIYAKE TATSUYA;MATSUURA HIROYASU;KUSUNOKI TOSHIAKI;YAMAMOTO KENICHI |
分类号 |
C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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