发明名称 VACUUM EVAPORATION SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide a vacuum evaporation system which can increase a total dispersion amount of a vapor deposition material from an evaporation source and improve film thickness uniformity to achieve a faster vapor deposition process.SOLUTION: A vacuum evaporation system includes a plurality of crucibles 20a, 20b which deposit a film of a vapor deposition material in opposition to a base plate arranged in a direction orthogonal to the longitudinal direction, and a heater 21-5 provided on outside-located one of longitudinal side faces of outermost crucibles 20a of the crucibles 20a, 20b.</p>
申请公布号 JP2015067850(A) 申请公布日期 2015.04.13
申请号 JP20130201817 申请日期 2013.09.27
申请人 HITACHI HIGH-TECH FINE SYSTEMS CORP 发明人 OGATA TOMOHIKO;MIYAKE TATSUYA;MATSUURA HIROYASU;KUSUNOKI TOSHIAKI;YAMAMOTO KENICHI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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