SYSTEM AND METHOD FOR CONTROLLING DROPLETS OF TARGET MATERIAL IN AN EUV LIGHT SOURCE

摘要

Methods and apparatuses for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system: to control droplet release and/or Irradiation are disclosed. A first set of sensors comprising one or more sensors detect droplets of target material as they pass through one or more curtains to enable adjustment of" the orientation of a droplet generator to more accurately direct subsequent droplets to the irradiation site, A second set of sensors comprising one or more sensors detect droplets as they pass through one or more curtains to determine when a source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet.