发明名称 SUBSTRATE HEAT TREATING APPARATUS
摘要 <p>PURPOSE: A substrate heat-treating apparatus is provided to efficiently perform a heat-treatment process with respect to a substrate by heating the center part of the substrate using a heat absorbing unit. CONSTITUTION: A heat-treating furnace(2) is located in a case(1) and performs a heat-treatment process with respect to a glass substrate(W). A boat(7) transfers the glass substrate into a process tube(4). A heat barrier(13) insulates radiant heat from a heater(5). A heat absorbing unit(14) located between the center part of the glass substrate on the boat and the heat barrier. The heat absorbing unit absorbs the radiant heat. A holding unit(15) detachably holds the heat absorbing unit.</p>
申请公布号 KR101507620(B1) 申请公布日期 2015.03.31
申请号 KR20090078636 申请日期 2009.08.25
申请人 发明人
分类号 H01L21/324 主分类号 H01L21/324
代理机构 代理人
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