| 摘要 |
<p>According to one embodiment, the imprinting apparatus of the embodiment provides an irradiation part, a pattern slippage quantity-detecting part, and a control part. The irradiation part fills the resist, which is dropped as a transfer material on the substrate to be treated, in the template pattern and cures the resist by irradiating the curing light. The pattern slippage quantity-detecting part detects the pattern slippage quantity between the substrate to be treated and the template. The control part controls the irradiation part so as to irradiate intermittently the curing light to each shot and revises the position relation between the substrate to be treated and the template so as to dissolve the pattern slippage between the substrate to be treated and the template based on the pattern slippage quantity detected during stopping of the curing light irradiation.</p> |
