显示装置制造用光罩、该光罩之制造方法、图案转印方法及显示装置之制造方法;PHOTOMASK FOR USE IN MANUFACTURING A DISPLAY DEVICE, METHOD OF MANUFACTURING THE PHOTOMASK, PATTERN TRANSFER METHOD AND METHOD OF MANUFACTURING A DISPLAY DEVICE

摘要

本发明系提供一种提升微细图案之转印性之显示装置制造用光罩。;本发明之显示装置制造用光罩系藉由于透明基板上将相位偏移膜、蚀刻掩膜、遮光膜分别利用湿式蚀刻进行图案化而形成包含遮光部、相位偏移部、透光部之转印用图案而成者，且上述遮光部系将上述相位偏移膜、上述蚀刻掩膜、上述遮光膜依序积层而成，上述相位偏移部系上述相位偏移膜，或将上述相位偏移膜与上述蚀刻掩膜依序积层而成，上述透光部系露出上述透明基板表面而成，上述相位偏移膜包含含有铬之材料，上述蚀刻掩膜包含对于上述相位偏移膜之蚀刻液具有抗蚀刻性之材料，上述相位偏移部与上述透光部具有相互邻接之部分，且上述相位偏移部与上述透光部系相对于上述光罩之曝光光之代表波长具有大致180度之相位差者。;[Solution] A photomask for use in manufacturing a display device has a transfer pattern which is formed on a transparent substrate by patterning each of a phase shift film, an etching mask film, and a light shielding film by wet etching and which includes a light shielding portion, a phase shift portion, and a light transmitting portion. The light shielding portion is composed of the phase shift film, the etching mask film, and the light shielding film which are laminated in this order. The phase shift portion is the phase shift film or is composed of the phase shift film and the etching mask film which are laminated in this order. The light transmitting portion is formed by exposing a part of a surface of the transparent substrate. The phase shift film is made of a material containing chromium. The etching mask film is made of a material having etch resistance against an etching liquid for the phase shift film. The phase shift portion and the light transmitting portion have parts adjacent to each other. The phase shift portion and the light transmitting portion have a phase difference of about 180 degrees with respect to a representative wavelength of exposure light of the photomask.