发明名称 Resin systems for dental restorative materials and methods using same
摘要 The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.
申请公布号 US8962709(B2) 申请公布日期 2015.02.24
申请号 US201313735709 申请日期 2013.01.07
申请人 The Regents of the University of Colorado, a Body Corporate 发明人 Bowman Christopher N.;Cramer Neil B.
分类号 A61F2/00;A61K6/02;A61K6/08;A61K6/087;A61K6/00;C08J7/12;C08G75/04;C08F2/48;C08F2/50;C09D4/00;C08F222/10 主分类号 A61F2/00
代理机构 Saul Ewing LLP 代理人 Saul Ewing LLP ;Doyle Kathryn;Silva Domingos J.
主权项 1. A photopolymerizable dental restorative composition comprising polymerizable monomers, wherein: about 50% to about 70% of the total weight of the polymerizable monomers is a methacrylate monomer, the balance by weight of the polymerizable monomers is a mixture of a thiol monomer and an ene monomer; and, the molar ratio of thiol functional groups from the thiol monomer relative to the ene functional groups from the ene monomer is greater than about 1.5:1.
地址 Denver CO US