| 发明名称 |
LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD |
| 摘要 |
A lithography apparatus includes a measuring station that includes a first measuring device configured to measure a height of a substrate holder, and a second measuring device configured to measure a height of a surface of a substrate held by the holder, and a patterning station that includes a third measuring device configured to measure a height of the holder, and patterns the substrate held by the holder based on an output of the second measuring device. The patterning station includes a fourth measuring device configured to measure a height of a surface of a substrate held by the holder. The lithography apparatus includes a controller configured to obtain a correction value for an output obtained from at least one of the first and third measuring devices based on outputs of the second and fourth measuring devices with respect to a substrate held by the holder. |
| 申请公布号 |
US2015042969(A1) |
申请公布日期 |
2015.02.12 |
| 申请号 |
US201414451727 |
申请日期 |
2014.08.05 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MORIKUNI Yuichiro;OHSAKI Yoshinori;MORIMOTO Osamu |
| 分类号 |
G03F9/00 |
主分类号 |
G03F9/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithography apparatus that patterns a substrate, the apparatus comprising:
a substrate holder configured to hold the substrate and be movable; a measuring station that includes a first measuring device including a first reference member and configured to measure a height of the substrate holder, and a second measuring device configured to measure a height of a surface of the substrate held by the substrate holder; a patterning station that includes a third measuring device including a second reference member and configured to measure a height of the substrate holder, and patterns the substrate held by the substrate holder based on an output of the second measuring device; and a controller, wherein the patterning station includes a fourth measuring device configured to measure a height of a surface of a substrate held by the substrate holder, and the controller is configured to obtain a correction value for an output obtained from at least one of the first measuring device and the third measuring device based on an output of the second measuring device and an output of the fourth measuring device with respect to a substrate held by the substrate holder. |
| 地址 |
Tokyo JP |
