Pattern matching method and image processing device

摘要

A pattern matching method for a scanning electron microscope comprises a step of performing pattern matching of only an upper layer pattern between an image (101) in which a pattern consisting of plural layers is represented and a template (104) in which the upper layer pattern of the plural layer pattern is selectively represented, thereby identifying the position of the pattern consisting of the plural layers. Then, information about the upper layer pattern is subtracted from the image (101), thus extracting shape information (108) about the lower layer pattern. Consequently, stable positioning or selective information extraction on a certain layer is enabled regardless of the state of the depths of a pattern formed in three dimensions or of the charge state of a sample.

主权项

1. A pattern matching method for performing pattern matching between a pattern on an image obtained by a scanning electron microscope and a registered template, the method comprising:
performing first pattern matching on image information representing the pattern, including a plurality of layers, within a first search range using a first template in which an upper layer of the pattern is included; specifying a second search range narrower than the first search range; and after positively charging the upper layer of the pattern, performing second pattern matching within the second search range using a second template, in which a lower layer of the pattern is included, to identify a position of the pattern.