发明名称 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN
摘要 A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.
申请公布号 US2015034593(A1) 申请公布日期 2015.02.05
申请号 US201414447376 申请日期 2014.07.30
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Matsumiya Tasuku;Seshimo Takehiro;Miyagi Ken;Maehashi Takaya;Dazai Takahiro;Utsumi Yoshiyuki
分类号 B05D3/10;B05D3/02;B05D3/14;B05D1/36 主分类号 B05D3/10
代理机构 代理人
主权项 1. A method of producing a structure containing a phase-separated structure, comprising: a step in which a layer composed of a neutralization film is formed on a substrate; a step in which a layer containing a block copolymer is formed on the layer composed of the neutralization film, in the block copolymer, a PA block and a PB block being mutually bonded, and the PB block being composed of a structural unit other than a structural unit constituting the PA block; and a step in which the layer containing the block copolymer is subjected to an annealing treatment to form a structure containing a phase-separated structure, wherein, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block (square root of the dispersive component (dPA)0.5, square root of the polar component (pPA)0.5), a coordinate point B of the PB block (square root of the dispersive component (dPB)0.5, square root of the polar component (pPB)0.5) and a coordinate point N of the neutralization film (square root of the dispersive component (dPN)0.5, square root of the polar component (pPN)0.5), respectively in a plane of coordinates (square root of the dispersive component (d)0.5, square root of the polar component (p)0.5), when the phase-separated structure is a PA matrix cylindrical structure, a coordinate point N of the neutralization film is within the range of an ellipse EA, wherein a point OA is a center of the ellipse EA and divides a line segment AB in the ratio of 3:7, the line segment AB is on a minor axis of the ellipse EA, a minor radius of the ellipse EA is 0.4 times the length of the line segment AB, and a major radius of the ellipse EA is 3 times the length of the line segment AB; when the phase-separated structure is a lamellar structure, the coordinate point N of the neutralization film is within the range of an ellipse E, wherein a point O is a center of the ellipse E and divides a line segment AB in the ratio of 5:5, the line segment AB is on a minor axis of the ellipse E, a minor radius of the ellipse E is 0.6 times the length of the line segment AB, and a major radius of the ellipse E is 3 times the length of the line segment AB; and when the phase-separated structure is a PB matrix cylindrical structure, the coordinate point N of the neutralization film is within the range of an ellipse EB, wherein a point OB is a center of the ellipse EB and divides a line segment AB in the ratio of 7:3, the line segment AB is on a minor axis of the ellipse EB, a minor radius of the ellipse EB is 0.4 times the length of the line segment AB, and a major radius of the ellipse EB is 3 times the length of the line segment AB.
地址 Kawasaki-shi JP