ELECTROCONDUCTIVE-FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING ELECTROCONDUCTIVE FILM

摘要

The purpose of the present invention is to provide: an electroconductive-film-forming composition that can form an electroconductive film having excellent electroconductivity and few voids; and a method for producing an electroconductive film by using said composition. This electroconductive-film-forming composition comprises: copper particles having an average particle diameter of from 1 nm to 10 µm; copper oxide particles having an average particle diameter of from 1 to 500 nm; a reducing agent having a hydroxy group; a metal catalyst including a metal other than copper; and a solvent. The content of said copper oxide particles is from 50 to 300 mass% with respect to the content of said copper particles. The content of said reducing agent is from 100 to 800 mol% with respect to the content of said copper oxide particles. The content of said metal catalyst is 10 mass% or less with respect to the content of said copper oxide particles.