| 发明名称 | Method and apparatus for vapor generation and wafer cleaning | ||
| 摘要 | The present disclosure describes an apparatus and a method for generating IPA vapor for condensation on a substrate in order to provide a vapor that is substantially free of particulate and molecular contaminants. The apparatus includes an inlet for liquid to enter, and a plurality of heated sloped surfaces to create thin sheets of flowing liquid on the surfaces from which the liquid can vaporize to form vapor. The liquid flows from one surface to another, vaporizing the liquid. | ||
| 申请公布号 | US8945281(B1) | 申请公布日期 | 2015.02.03 |
| 申请号 | US201414168692 | 申请日期 | 2014.01.30 |
| 申请人 | MSP Corporation | 发明人 | Dinh Thuc M.;Ma Yamin;Liu Benjamin Y. H. |
| 分类号 | B01D19/00;H01L21/02 | 主分类号 | B01D19/00 |
| 代理机构 | Westman, Champlin & Koehler, P.A. | 代理人 | Westman, Champlin & Koehler, P.A. ;Sawicki Z. Peter |
| 主权项 | 1. An apparatus for vaporizing a liquid to form vapor, said apparatus including an inlet for liquid to enter, and a plurality of heated sloped surfaces to create thin sheets of liquid on the surfaces from which the liquid can vaporize to form vapor. | ||
| 地址 | Shoreview MN US | ||