MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

摘要

The present invention relates to a monomer for hardmask compositions expressed by chemical formula 1, a hardmask composition including the same and a method for forming patterns using the same. In chemical formula 1, A, A′, L, X, X′, k, l, m and n are defined the same as in the patent specification.