发明名称 |
OVERLAY ERROR MEASURING DEVICE AND COMPUTER PROGRAM FOR CAUSING COMPUTER TO MEASURE PATTERN |
摘要 |
The purpose of the present invention is to provide an overlay error measuring device which measures an overlay error with high accuracy even when a lower layer pattern is disposed under a thin film and a sufficient signal amount cannot be ensured. The present invention proposes an overlay error measuring device provided with an arithmetic processing unit for measuring a pattern formed on a sample on the basis of a signal waveform obtained by a charged particle beam device. The arithmetic processing unit finds a correlation with the signal waveform using a partial waveform obtained on the basis of partial extraction of the signal waveform, forms a correlation profile indicating the correlation, and measures an overlay error using the correlation profile. |
申请公布号 |
KR20140146658(A) |
申请公布日期 |
2014.12.26 |
申请号 |
KR20147031970 |
申请日期 |
2013.06.05 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
YAMAGUCHI SATORU;SAKAI KEI;INOUE OSAMU;HIRAO KAZUYUKI;KOMURO OSAMU |
分类号 |
G01B15/00;G01B15/04;H01L21/66 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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