发明名称 Gate Stack for Normally-Off Compound Semiconductor Transistor
摘要 A normally-off compound semiconductor transistor includes a heterostructure body and a gate stack on the heterostructure body. The heterostructure body includes a source, a drain spaced apart from the source, and a channel for connecting the source and the drain. The channel includes a first two-dimensional charge carrier gas of a first polarity arising in the heterostructure body due to piezoelectric effects. The gate stack controls the channel in a region of the heterostructure body under the gate stack. The gate stack includes at least one III-nitride material which gives rise to a second two-dimensional charge carrier gas of a second polarity opposite the first polarity in the gate stack or in the heterostructure body under the gate stack due to piezoelectric effects. The second two-dimensional charge carrier gas counter-balances polarization charges in the first two-dimensional charge carrier gas so that the channel is disrupted under the gate stack.
申请公布号 US2014374765(A1) 申请公布日期 2014.12.25
申请号 US201313921630 申请日期 2013.06.19
申请人 Infineon Technologies Austria AG 发明人 Curatola Gilberto
分类号 H01L29/778;H01L29/205;H01L29/20;H01L29/66 主分类号 H01L29/778
代理机构 代理人
主权项 1. A normally-off compound semiconductor transistor, comprising: a heterostructure body including a source, a drain spaced apart from the source, and a channel for connecting the source and the drain, the channel comprising a first two-dimensional charge carrier gas of a first polarity arising in the heterostructure body due to piezoelectric effects; and a gate stack on the hetero structure body for controlling the channel in a region of the heterostructure body under the gate stack, the gate stack comprising at least one III-nitride material which gives rise to a second two-dimensional charge carrier gas of a second polarity opposite the first polarity in the gate stack or in the heterostructure body under the gate stack due to piezoelectric effects, the second two-dimensional charge carrier gas counter-balancing polarization charges in the first two-dimensional charge carrier gas so that the channel is disrupted under the gate stack absent a gate voltage applied to the gate stack, wherein the second two-dimensional charge carrier gas is spaced apart from and electrically disconnected from the source and the drain.
地址 Villach AT