发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a semiconductor device including a transistor with excellent electric characteristics, and to provide a semiconductor device having a high opening ratio and including a capacitative element, and capable of increasing charge capacity.SOLUTION: A semiconductor device comprises: a gate electrode; an oxide semiconductor film overlapping the gate electrode; an oxide insulating film in contact with the oxide semiconductor film; a first barrier film to oxygen provided between the gate electrode and the oxide semiconductor film; and a second barrier film to oxygen in contact with the first barrier film to oxygen. The oxide semiconductor film and the oxide insulating film are provided inside the first barrier film to oxygen and the second barrier film to oxygen.</p> |
申请公布号 |
JP2014241403(A) |
申请公布日期 |
2014.12.25 |
申请号 |
JP20140099394 |
申请日期 |
2014.05.13 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI;MIYAKE HIROYUKI;OKAZAKI KENICHI;HAYAKAWA MASAHIKO;MATSUDA SHIMPEI |
分类号 |
H01L21/336;G02F1/1368;H01L21/822;H01L21/8234;H01L27/04;H01L27/06;H01L27/08;H01L29/786;H01L51/50;H05B33/08;H05B33/14;H05B33/22 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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