发明名称 Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL AND PRODUCTION METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide an Fe-Co-based alloy sputtering target material suitable for forming a soft magnetic film having high smoothness, and to provide a production method thereof.SOLUTION: In an Fe-Co-based alloy sputtering target material, the composition formula in the atomic ratio is expressed as follows: (Fe-Co)-Zr-W, 30≤x≤80, 7≤y≤18, 7≤z≤18, and the balance comprises inevitable impurities, and y and z in the composition formula satisfy following proportional expression: y:z=1:1 to 1:3. Preferably, the deflection strength is 400 MPa or higher.</p>
申请公布号 JP2014240515(A) 申请公布日期 2014.12.25
申请号 JP20130123512 申请日期 2013.06.12
申请人 HITACHI METALS LTD 发明人 FUKUOKA ATSUSHI;SAKAMAKI KOICHI;SAITO KAZUYA
分类号 C23C14/34;B22F3/15;C22C19/07;C22C38/00 主分类号 C23C14/34
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