发明名称 |
SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS HAVING SAME, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND LIQUID REPELLENT PLATE |
摘要 |
A substrate holder (PH) includes a base (PHB); a first holding portion (PH1) which is formed on the base (PHB) and which attracts and holds a substrate (P); and a second holding portion (PH2) which is formed on the base (PHB) and which attracts and holds a plate member (T) in the vicinity of the substrate (P) attracted and held by the first holding portion (PH1). In an exposure apparatus including such a substrate holder (PH), the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure. |
申请公布号 |
KR20140140647(A) |
申请公布日期 |
2014.12.09 |
申请号 |
KR20147032469 |
申请日期 |
2005.06.08 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIBAZAKI YUICHI |
分类号 |
H01L21/027;G03F7/20;G03F9/00;H01L21/68;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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