Layout pattern modification method

摘要

A method of layout pattern modification includes the following steps: step 1: performing an OPC process on a layout containing a plurality of square patterns to obtain a plurality of post-OPC patterns in correspondence with the plurality of square patterns; step 2: performing a manufacturing rule check on each of the plurality of post-OPC patterns to identify, from the plurality of post-OPC patterns, one or more post-OPC patterns violating the manufacturing rule; and step 3: rotating at least one of the one or more post-OPC patterns violating the manufacturing rule; and step 4: performing a manufacturing rule check on each of the rotated and non-rotated post-OPC patterns, if no post-OPC pattern violating the manufacturing rule is identified, finishing the process; otherwise, if one or more post-OPC patterns violating the manufacturing rule are identified, continuing to perform step 3 and step 4.

主权项

1. A computer-implemented method of layout pattern modification, comprising the following steps:
step 1: performing, by a processor, an optical proximity correction (OPC) process on a layout containing a plurality of square patterns to obtain a plurality of post-OPC patterns in correspondence with the plurality of square patterns; step 2: performing, by the processor, a check of a manufacturing rule on each of the plurality of post-OPC patterns to identify, from the plurality of post-OPC patterns, one or more post-OPC patterns violating the manufacturing rule; step 3: rotating at least one of the one or more post-OPC patterns violating the manufacturing rule; and step 4: performing, by the processor, a check of the manufacturing rule on each of the rotated and non-rotated post-OPC patterns, if no post-OPC pattern violating the manufacturing rule is identified, finishing the OPC process; otherwise, if one or more post-OPC patterns violating the manufacturing rule are identified, continuing to perform step 3 and step 4.