发明名称
摘要 According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid when exposed to actinic rays or radiation.
申请公布号 JP5608492(B2) 申请公布日期 2014.10.15
申请号 JP20100206643 申请日期 2010.09.15
申请人 发明人
分类号 G03F7/039;C08F220/28;G03F7/004;H01L21/027 主分类号 G03F7/039
代理机构 代理人
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