发明名称 METHOD AND DEVICE FOR PERMANENT BONDING OF WAFERS, AS WELL AS CUTTING TOOL
摘要 <p>A method for bonding a first bond surface of a first solid substrate consisting of a first material to a second bond surface of a second solid substrate consisting of a second material. The method including the steps of: working one of the first and/or second bond surfaces with a cutting tool at a speed vs that is below a critical speed vk and at a temperature Ts that exceeds a critical temperature Tk, down to a surface roughness O that is less than 1μm; bringing the first solid substrate into contact with the second solid substrate at the bond surfaces, and exposing the solid substrates that are in contact to temperature in order to form a permanent bond that is at least primarily produced by recrystallization at the bond surfaces.</p>
申请公布号 KR101447390(B1) 申请公布日期 2014.10.06
申请号 KR20137002005 申请日期 2012.01.23
申请人 发明人
分类号 B23K20/00;B23K20/22;B23K20/24 主分类号 B23K20/00
代理机构 代理人
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