发明名称 TEMPORARY ADHESIVE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, ADHESIVE SUPPORT USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a temporary adhesive for manufacturing a semiconductor apparatus which can reduce the problem that the temporary adhesive emits gas in the temporary support at high temperature when a member to be processed (such as a semiconductor wafer) is subjected to mechanical and chemical treatment and can easily release the temporal support to the member to be processed without damaging the member to be processed even after the high temperature process.SOLUTION: There is provided a temporary adhesive for manufacturing a semiconductor apparatus which comprises: (A) a radical polymerizable monomer; (B) a tri- or more functional radical polymerizable monomer; (C) a polymeric compound; and (D) a radical polymerization initiator.</p>
申请公布号 JP2014189731(A) 申请公布日期 2014.10.06
申请号 JP20130068822 申请日期 2013.03.28
申请人 FUJIFILM CORP 发明人 IWAI HISASHI;KOYAMA ICHIRO;FUJIMAKI KAZUHIRO
分类号 C09J4/00;C09J4/02;C09J11/06;C09J171/02;H01L21/02;H01L21/304 主分类号 C09J4/00
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