| 摘要 |
PROBLEM TO BE SOLVED: To prevent mutual contamination caused by residual chips of photoresist coatings, by removing chips of coating films in a treatment tank.SOLUTION: A lifter 9 holding a plurality of substrates W is placed in a treatment position; a stripping liquid is circulated to carry out a stripping process; and then the lifter 9 is elevated to a stand-by position. Bubbles are supplied from a bubble supply pipe 19; an ultrasonic vibration imparting unit 21 is actuated to carry out a pulverizing process for finely pulverizing chips of photoresist coatings in a treatment tank 3; and then the stripping liquid in the treatment tank 3 is discharged through discharge pipes 33, 37. As the chips of the photoresist coatings are finely pulverized, they can be easily carried by a liquid flow in the discharge pipe 33 during the stripping liquid is discharged from the treatment tank 3. Therefore, even when a new striping liquid is supplied into the treatment tank 3, chips of the photoresist coatings can be prevented from mixing into the liquid, and mutual contamination during the treatment by the new stripping liquid can be prevented. |
