BALANCING MASK LOADING

摘要

Among other things, techniques for balancing mask loading are provided for herein. In some embodiments, one or more windows are defined within a layout. Based upon polygons comprised within respective windows, a localized mask loading is computed for the layout. In some embodiments, a global mask loading is also computed for the layout. Using the localized mask loading and the global mask loading, if computed, a loading effect of a plurality of mask pattern schemes is evaluated to identify a mask pattern scheme having a desired loading effect.

主权项

1. A method, comprising:
receiving a layout comprising a set of polygons associated with a semiconductor device; defining a first window within the layout, a first subset of the set at least partially situated within the first window; defining a second window within the layout, a second subset of the set at least partially situated within the second window; computing a first localized mask loading for the first window and the second window if a first mask pattern scheme is assigned to the layout; computing a second localized mask loading for the first window and the second window if a second mask pattern scheme is assigned to the layout; and assigning the first mask pattern scheme or the second mask pattern scheme to the layout based upon the first localized mask loading and the second localized mask loading.